Time-of-Flight Secondary ion Mass Spectrometry (ToFSIMS Analysis)
ToFSIMS provides detailed chemical information from the surface of materials with unequivocal characterisation of elements, chemical groups, polymers and surface additives.
The technique is non-destructive and highly surface specific with detection sensitivity in the ppm range for most elements. ToFSIMS involves sputtering the sample area of interest with a pulsed beam of bismuth primary ions (Bin+ where n = 1-3). Elemental and molecular fragment ions formed at the surface are mass-analysed to produce data in the form of mass spectra, chemical images or depth profiles. A feature of ToFSIMS is the high mass resolution which allows accurate mass analysis for clear identification of empirical formulae of unknown materials.
- Elemental and molecular information from the uppermost 1-2 nm of the surface
- Detailed chemical information and empirical formulae through the use of extensive library spectra and accurate mass analysis
- Detection sensitivity in the ppm range for most elements
- Chemical imaging of elements, their isotopes and molecular species with sub-micron lateral resolution
- Retrospective mass spectral and imaging analysis of complex surfaces using Region Of Interest mode.
Typical applications
- Characterisation of surface additives on polymer materials
- Investigation of stains and rinse residues on semiconductor wafers and devices
- Monitoring of surface cleaning treatments on medical devices
- Chemical imaging of contaminants and additives on polymer films.
Typical industries using ToFSIMS
- Healthcare
- Medical Device
- Printing
- Packaging
- Semiconductors
- Electronics
- Aerospace
- Automotive.
