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[July 2002]
Focussed Ion Beam System Launched
A new focussed ion beam milling system - suitable for specimen preparation of semiconductors and other advanced materials for both scanning electron microscopy (SEM) and transmission electron microscopy (TEM) - has been announced by Hitachi High-Technologies Corporation (Wokingham, Berks, England). The FB-2100 joins the FB-2000A in providing complex surface etching capabilities combined with high resolution scanning ion imaging, says the company.The FB-2100 features a new, low aberration ion optical system, which can deliver a maximum beam current of 30nA at an accelerating voltage of 40kV. This enables a maximum beam current density of 25A/cm2 to be achieved at 40kV, for faster milling.
Specimen holders compatible with the FB-2100 and Hitachi SEMs and TEMs are available to allow specimens to be prepared in the FB-2100 and then transferred easily to the appropriate microscope, without the need to reposition the sample. This minimises specimen damage during repeated milling/microscopy cycles.
The FB-2100 also offers scanning ion microscopy capabilities to allow the user to locate the areas to be milled. Hitachi says that excellent resolution of 6nm or better can be achieved at an acceleration voltage of 40kV, which is much better than can be achieved with systems using optical microscopy techniques.
The FB-2100 can be used for a host of applications, including site specific microsampling using step and box millings, sequential area milling followed by 3D reconstruction techniques and preparation of samples to give improved spatial resolution for EDX analysis.
ENDS