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[July 2002]
MAC Introduces Diamonex CD Source
Morgan Advanced Ceramics (MAC) - the leading supplier of innovative ceramic solutions for a range of user markets - has introduced its Diamonex Closed-drift (CD) Source, a trademarked system. This is described as a flexible source ideally suited for a wide range of manufacturing processes that benefit from high flux ions, including substrate cleaning, reactive ion beam etching and ion beam assisted deposition of thin films. It is also said to be a useful tool for high-rate, reliable deposition of DLC coatings.The gridless design of the Diamonex CD Source allows a high ion flux and the substrate will not be contaminated by particles released by the grid. The CD Source includes an integrated, on axis hollow cathode electron source, eliminating filaments that burn out or contaminate substrates.
The hollow cathode produces a charge-neutralised beam so that no substrate bias is required. The unique anode design allows for stable, long-term operation with no process gas restriction, says MAC. Using an electromagnet, the CD Source allows flexibility for process development by enhancing and refining the coating material properties.
The Diamonex CD Source is available in a compact (3.5in) flange or internally mounted housing operated using state-of-the-art DC and AC power supplies for maximum reliability. MAC adds that there are no RF interference issues with this source.
ENDS